Application for the Sputtering Materials

Application for the Sputtering Materials

Substrate Target Coating Layer Application Characteristics BUWON Products
Glass ITO ITO • Resistance • High light transmittance
• Decrease resistance with thickness
• TP:200~500ohm
• TN/STN:24~200ohm
• IMITO Index match: conductive           layer
• EC mirror conductive layer
Nb NbOx • Optical • High refractive optical film layer, non-conductive • TP : Optical Layer Application
• IMITO: Optical Layer Application
• AR : Optical Layer Application
• IR : Optical Layer Application
• Half mirror
Si SiO2 • Optical • Low refractive optical film layer, non-conductive • TP : Bottom/Optical Layer Application
• TN/STN : Bottom layer
• IMITO: Index match Optical Layer
• AR : Optical Layer Application
• IR : Optical Layer Application
• Half mirror
Si3Nx • Optical
• Insulation
• High refractive optical film layer, non-conductive • AR : Optical Layer Application
Cr Cr • Protect
• Decorate
• Conductive metal, applied as a protective or decorative layer • EC Mirror: Decorative layer
• CPT : Metal: Protective layer
Al Al • Resistance • Conductive metal, applied as conductive layer • CPT : Metal conductive layer
Mo Mo • Protect • Conductive metal, applied as a protective layer • CPT: Metal Protective layer
Ti Ti • adhesion • Conductive metal, for improved material adhesion applications • Cu Metal adhesion improve layer
Cu Cu • Resistance • Conductive metal, applied as conductive layer • Cu Metal conductive layer
Ag Ag • Resistance • Conductive metal, applied as conductive layer
• Highly reflective
• EC mirror conductive layer
• EC mirror reflective layer